HITACHI HIGH-TECHNOLOGIES
Hitachi High-Technologies was formed in 2001 through a merger of three companies that created a unique combination of manufacturing, sales, and service capabilities. The Instruments Group of Hitachi, Ltd. brought an established reputation in measuring technologies; the Semiconductor Manufacturing Equipments Group of Hitachi, Ltd. supported the efficiency of technology and the realization of more sophisticated performance; and Nissei Sangyo Co., Ltd., provided both a trading function specialized in cutting edge technology, with a focus on electronic products, and the ability to construct new businesses based on its global network.
HITACHI HIGH-TECHNOLOGIES
Industry:
Electronics
Founded:
1947-04-12
Address:
Schaumburg, Illinois, United States
Country:
United States
Website Url:
http://www.hitachi-hitec.com
Total Employee:
10001+
Status:
Active
Contact:
1-847-273-4141
Technology used in webpage:
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Current Employees Featured
Stock Details
Acquisitions List
| Date | Company | Article | Price |
|---|---|---|---|
| 2019-01-16 | Applied Physics Technologies | Applied Physics Technologies acquired by Hitachi High-Technologies | N/A |
| 2017-04-26 | Oxford Instruments Analytical | Oxford Instruments Analytical acquired by Hitachi High-Technologies | N/A |
Investments List
| Date | Company | Article | Money raised |
|---|---|---|---|
| 2022-04-13 | Nabsys | Hitachi High-Technologies investment in Corporate Round - Nabsys | 25 M USD |
| 2019-10-02 | Nabsys | Hitachi High-Technologies investment in Series F - Nabsys | 21 M USD |
| 2019-05-30 | Oxide | Hitachi High-Technologies investment in Venture Round - Oxide | 68 M USD |
| 2018-03-20 | Flutura | Hitachi High-Technologies investment in Venture Round - Flutura | 1000 K USD |
| 2017-09-27 | Reno Sub Systems | Hitachi High-Technologies investment in Series C - Reno Sub Systems | 11.2 M USD |
| 2017-07-25 | NeU Japan | Hitachi High-Technologies investment in Venture Round - NeU Japan | 183 M JPY |
| 2016-08-31 | Oxide | Hitachi High-Technologies investment in Venture Round - Oxide | 198 M JPY |
| 2012-04-23 | Sphelar Power | Hitachi High-Technologies investment in Venture Round - Sphelar Power | N/A |
Newest Events participated
Official Site Inspections
http://www.hitachi-hitec.com
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